SITE Services, Inc., a wafer fabrication equipment manufacturer, recently announced the company had delivered the first in a series of innovative five-module track systems designed for the application of a variety of photolithography materials. Expanding upon its field-proven Tractrix™ platform, the five-module Tractrix™ Spin Track wafer fabrication system is an innovative, small-footprint, spin track system that can be configured as a coater or developer with up to three hot plate stages for specialized process.

The principal reason for developing this new track system was to provide an application methodology for specialized resist and other coatings such as inter-layer dielectric (ILD) material which require multi-temperature curing. An additional benefit of the system is its relative low cost, especially when put in the context of a 200mm wafer tab. The tool has an exceptionally small footprint (19" x 81") and may be configured for processing substrates ranging in size from 2" to 200mm. 

Please browse our site further for more information on wafer fabrication systems that SITE has to offer.

| Information on Photolithography | Photoresist Equipment | Photoresist Track Systems | Semiconductor Equipment | Semiconductor Wafer Processing | Silicon Wafer | Spin Track | Organic Light Emitting Diodes, OLED | Wafer Coating | Wafer Fabrication |