wafer coating

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Tractrix Spin ToolGraphical User InterfaceFeaturesProcess FlowsRequest Info

Tractrix™ Spin Tool Features

See also our Optional Features !

Intuitive Programming

Spreadsheet-style programming makes creating process recipes easy. A 200 line program capability and a large program storage capacity eliminates the need to link programs together or to frequently load programs into memory.


Linear Transfer Arm

The Linear Transfer Arm (LTA) is designed for rigorous use yet has the soft touch required to handle fragile substrates like 150mm GaAs wafers and backside-ground 200mm Si wafers. A microstepping motor precisely positions substrates at each process module.


Spin Motor

An advanced servo motor delivers uniform spin speeds and acceleration ramp rates for precise, repeatable film thickness coating. The need for continual calibration is eliminated.


FilmStar™ Nozzle

SITE's FilmStar coater nozzle assembly incorporates four easily replaced dispense nozzles plus topside edge bead removal (EBR). The Traversing Dispense Arm (TDA) utilizes the same stepper motor technology as the LTA, providing precise, repeatable dispense centering.

Accross wafer coating uniformity graph

Wafer to wafer coating uniformity graph


DevStar™ Nozzle

Tractrix™ developer systems use our DevStar nozzle which provides rapid wafer wetting, minimal chemical consumption and outstanding CD uniformity.


TT HPO-2000 Hot Plate

Advanced hotplate design produces clean, uniform proximity baking. A fuzzy logic temperature controller provides rapid temperature ramp with no overshoot.


Particle Control

By minimizing moving parts, eliminating pneumatic sensors and managing cabinet air flow, the Tractrix™ system exhibits extremely few particles per wafer pass.


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