SITE Services' photoresist track systems are second to none. Some of the innovative features of our Tractrix™ Spin Tool include the following:

· FilmStar™ Nozzle - SITE's FilmStar coater nozzle assembly incorporates four easily replaced dispense nozzles plus topside edge bead removal (EBR). The Traversing Dispense Arm (TDA) utilizes the same stepper motor technology as the LTA, providing precise, repeatable dispense centering.

· DevStar™ Nozzle - Tractrix™ developer systems use our DevStar nozzle that provides rapid wafer wetting, minimal chemical  consumption and outstanding CD uniformity.

· TT HPO-2000 Hot Plate - Advanced hotplate design produces clean, uniform proximity baking. A fuzzy logic temperature controller provides rapid temperature ramp with no overshoot.

· Particle Control - By minimizing moving parts, eliminating pneumatic sensors and managing cabinet air flow, the Tractrix™ photoresist track systems exhibit extremely few particles per wafer pass.

For further information on the Tractrix™ Spin Tool photoresist track systems from SITE Services Inc., please browse our site.

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