SITE Services' photo resist developer equipment is second to none. Some of the innovative features of our Tractrix™ Spin Tool include the following:

· Intuitive Programming - Spreadsheet-style programming makes creating process recipes easy. A 200 line program capability and a large program storage capacity eliminates the need to link programs together or to frequently load programs into memory.

· Linear Transfer Arm - The Linear Transfer Arm (LTA) is designed for rigorous use yet has the soft touch required to handle fragile substrates like 150mm GaAs wafers and backside-ground 200mm Si wafers. A microstepping motor precisely positions substrates at each process module.

· Spin Motor - An advanced servo motor delivers uniform spin speeds and acceleration ramp rates for precise, repeatable film thickness coating. The need for continual calibration is eliminated.

SITE brings these advanced features together into a photoresist equipment system with a small price tag and a low cost of ownership. For further information on the Tractrix™ Spin Tool photo resist developer equipment from SITE Services Inc., please browse our site.

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