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Edge
Bead Removal (EBR), Edge Bead Removers
The
Tractrix™ Spin
Track tool has edge
bead removal (EBR) capabilities
and is a stand alone, small-footprint track system
designed for the spin deposition of photoresist,
developer, polymer and other materials common to
integrated circuit photolithography. Built with the
philosophy of 'one controller for one track', the Tractrix™ Spin
Track tool is highly reliable. Its proprietary, single-axis
linear transfer arm (LTA) will gently and efficiently
transport substrates
ranging from 2 inches to 200 mm between the process
modules.
Owing to its unique, efficient design, the Tractrix™ system
is easier to operate and requires far less maintenance
than any other track system utilizing multi-axis
robotic transfer. The tool's flexibility makes
it a low-cost solution for production, R&D,
special applications, or as a backup system when
other tracks are off-line for maintenance. Whether
your process is g-line, i-line, DUV, low-k dielectric
or something completely unique, SITE's Tractrix™ system
can be configured accordingly.
For more information on edge
bead removal (EBR) or our edge
bead removers, please browse our
site.
Information on Photolithography |
Photoresist Equipment |
Photoresist Track Systems |
Semiconductor Equipment |
Semiconductor Wafer Processing |
Silicon Wafer |
Spin Track |
Organic Light Emitting Diodes, OLED |
Wafer Coating |
Wafer Fabrication |
Spin Coater |
Manual Spinner |
Resist Coater |
Spin Developer |
Photo Resist Coater |
Photo Resist Developer |
Manual Spin Coater |
Edge Bead Removal
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